4-Trifluoromethyl diphenyl sulfide is an electron-deficient aromatic thio-ether in which a strongly electron-withdrawing trifluoromethyl group is located para to the sulfur bridge. The compound is air- and photo-stable, miscible with all common organic solvents (dichloromethane, chloroform, ethyl acetate, toluene, alcohols, ketones), and essentially insoluble in water.
Key physicochemical data:
Density: 1.29 g cm⁻³ (20 °C)
Refractive index n²⁰/D: 1.53
Boiling point: 265 °C / 760 mmHg (predicted)
Flash point: > 110 °C
Log P (octanol/water): 5.1 (predicted)
Typical uses:
Building block for trifluoromethyl-diphenyl sulfoxide/sulfone pharmaceutical intermediates and agro-chemicals.
Precursor for electron-poor diaryl sulfones used as COX-2 inhibitors, herbicide safeners and UV-absorbers.
Model substrate for mechanistic studies on electron-deficient C–S bond activation and cross-coupling reactions.
Quality specification (commercial grade):
Purity (GC): ≥98 %
Water content (KF): ≤0.2 %
Free thiol (as PhSH): ≤0.1 %
Residue on ignition: ≤0.1 %
Heavy metals: ≤20 ppm
Hazard statement:
Causes skin and eye irritation (R36/37/38). Avoid inhalation of vapour; use gloves, goggles and adequate ventilation. SDS available on request.
